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155篇 您的检索式:作者名="Dornfeld D"
    题名 作者 年代 出处 被引量
1Automated energy monitoring of machine tools显示文摘Vijayaraghavan A Dornfeld D 0,,01:2
2, In-process detection of microscratctling during CMP using acoustic emission sensing technology 显示文摘Tang J Dornfeld D Pangrle S K 1998Journal of Electronic Materials1998,27,10:1
3Advancing Cutting Technology 显示文摘Byrne G Dornfeld D Denkena B 2003Annals of the CIRP2003,52,2:1
4Monitoring of uhraprecision machining processes 显示文摘Dornfeld D A Lee Y Chang A 2003The International Journal of Advanced Manufacturing Technology2003,21,8:1
5An Investigation of Material Removal Mechanisms in Lapping with Grain Size Transition 显示文摘Chang Y P Hanshimura M Dornfeld D A 2000Journal of Manufacturing Science and Engineering2000,122,6:1
6Micro burr formation and minimi- zation through process control显示文摘LEEK DORNFELD D A 2005Precision Engineering2005,29,2:1
7Distress conditions during pregnancy may lead to pre- eclampsia by increasing cortisol levels and altering lymphocyte sensitivity to glucorticoids 显示文摘Vianna P Bauer ME Dornfeld D 2011Med Hypotheses2011,77,2:1
8Burr/breakout model development and experimental verification显示文摘Chern G L Dornfeld D 1996Journal of Engineering Materials and Technology1996,118,2:1
9Recent Advancesin Mechanical Micromachining显示文摘DORNFELD D MIN S Takeuchi Y 2006Annals of the CIRP2006,55,:1
10Recent advances in mechanicalmicromachining 显示文摘Dornfeld D Min S Takeuchi Y 2006CIRP Annals2006,55,1:1
11Material removal mechanism in chemical mechanical polishing: theory and modeling 显示文摘Luo J Dornfeld D A 2001IEE Trans Semicond Manufact2001,,14:1
12Material Removal Mechanism in Chemical Mechanical Polishing:Theory and Modelling显示文摘Luo J F Dornfeld D A 2001IEEE Transaction on Semiconductor Manufacturing2001,14,2:1
13Material Removal Mechanism in Chemical Mechanical Polishing:Theory and Modeling显示文摘Luo Jianleng Dornfeld D A 2001IEEE Transactions on Semiconductor Manufacturing2001,14,2:1
14Energy consumption characterization and reduction strategies for milling machine tool use显示文摘DIAZ N REDELSHEIMER E DORNFELD D 2011Proceedings of the 18th CIRP International Conference on Life Cycle Engineering2011,,:1
15An investigation of material removal mechanisms in lapping with grain size transition显示文摘CHANG Y P HASHIMURA M DORNFELD D A 2000Journal of Manufacturing Science and Engineering2000,122,:1
16Recent advances in mechanical micromachining 显示文摘Dornfeld D Min S Takeuchi Y 2006Annals of the CIRP2006,55,2:1
17Material removal mechanism in chemical mechanical polishing: theory and modeling显示文摘LUO J F DORNFELD D A 2001IEEE Transactions on Semiconductor Manufacturing2001,14,:1
18Micro-burr formation andminimization through process control 显示文摘LEE K DORNFELD D A 2005Precision Engi- neering2005,29,2:1
19An experimental study on burr formation in micro milling aluminum and copper显示文摘Lee K Dornfeld D A 2002Transactions of the North American Manufacturing Research Institute of SME2002,30,:1
20Drilling burr formation in titanium alloy Ti-6A1-4V 显示文摘DORNFELD D A KIM J S DECHOW H 1999CIRP An- nals- Manufacturing Technology1999,48,1:1
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