维普期刊资源整合服务平台（V6.5）

维普中文期刊产品整合服务

1篇 您的检索式：作者名="MAKITA Yunosuke"

选中清除导出查看参考文献查看引证文献引用追踪共1页首页上一页第1页下一页末页 /1 跳转

		题名	作者	年代	出处	被引量
	1	Fabrication of iron disilicide from multilayer by helicon plasma sputtering显示文摘Helicon plasma sputtering of Fe/Si multilayer followed by thermal annealing in Ar atmosphere was used to fabricate β-FeSi2 films. [Fe 0.5nm/Si 1.6nm] 120 multilayer was deposited on Si(100) substrate and then the samples were annealed at 900℃ for 2h or at 9001000℃ for 10s. Annealed samples were characterized by X-ray diffractometry(XRD), Rutherford backscattering spectroscopy, scanning electron microscopy and optical absorption measurement. (202)/(220) oriented β-FeSi2 films are fabricated from the multilayer according to XRD patterns. It is found that there is a very small redistribution of Fe and Si components in the films during the thermal annealing, so that a good stoichiometry of FeSi2 can be obtained. It is also revealed by scanning electron microscopy that multilayer technology can result in a smooth surface for β-FeSi2 films. Optical absorption spectra demonstrate that the films have a direct band gap of 0.9eV at room temperature.	沈鸿烈杨颖 SAKAMOTO Isao KOIKE Masaki MAKITA Yunosuke	2005	中国有色金属学会会刊:英文版2005，15，S3：	0

返回顶部每页显示：

共1页首页上一页第1页下一页末页 /1 跳转

goolge学术搜索-维普

网站首页 | 关于我们 | 联系我们 | 产品服务 | 客服中心 | 广告服务 | 版权声明 | 网站联盟 | 友情链接 | 售卡网点

版权所有© 渝B2-20050021-1　渝公网安备 50019002500403号　违法和不良信息举报中心

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费