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20篇 您的检索式:作者名="Lenardi C"
    题名 作者 年代 出处 被引量
1Nitricoxide synthase mediates PC 12 differentiationinduced by the surface topography of nanostructuredTi02显示文摘Tamplenizza M Lenardi C Maffioli E 2013J Nanobiotechnology2013,11,:1
2Cluster beam deposition and in situ characterization of carbyne-rich carbon films显示文摘Ravagnan L Siviero F Lenardi C 2002Phys Rev Lett2002,89,28:1
3XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak position 显示文摘Baker M A Gilmore R Lenardi C 1999Applied Surface Science1999,150,:1
4Ion beam deposition carbon nitride films: characterization and identification of chemical sputtering 显示文摘 Baker M A Lenardi C 1996Thin Solid Films1996,,:1
5Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C 1998Thin Solid Films1998,333,12:1
6XPS investigation of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak position显示文摘M A Baker R Gilmore C Lenardi 1999Applied Surface Science1999,150,:1
7Inteventional spinal procedures显示文摘Andreula C Muto M Lenardi M 2004Euro J Raidol2004,50,2:1
8Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C Haupt J R 1998Thin Solid Films1998,,312:1
9Simulation of Berkovich nanoindentation experiments on thin films using finite element method 显示文摘LICHINCHI M LENARDI C HAUPT J VITALI R 1998Thin Solid Films1998,312,:1
10Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C Haupt J 1998Thin Solid Films1998,312,12:1
11Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C Haupt J 1998Thin Solid Films1998,312,:1
12Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C Haupt J 1998Thin Solid Films1998,312,12:1
13XPS investigation of preferential sputtering of S from M0S2 and determination of MoSx stoichiometry from Mo and S peak positions 显示文摘BAKER M A GILMORE R LENARDI C GISSLER W 1999Applied Surface Science1999,150,:1
14Low-temperature sputt er deposition and characterisation of carbon nitride films显示文摘 Hammer P Lenardi C 1997Surf Coat Techn ol1997,97,:1
15XPS investiga tion of preferential sputtering of S from MoS2 and determination of MoSx stoichiometry from Mo and S peak positions显示文摘BAKER M A GILMORE R LENARDI C 1999Applied Surface Science1999,150,:1
16Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘LICHINCHI M LENARDI C HAUPT J VITALI R 1998Thin Solid Films1998,312,12:1
17Simulation on Berkovich nanoindentation experiments on thin films using finite element method显示文摘Liehinehi M Lenardi C Haupt J 1998Thin Solid Films1998,312,:1
18XPS investigation of preferential sputtering of S from MoS2 and determination of MoSS stoichiometry from Mo and S peak positions显示文摘Baker M A Gilmore R Lenardi C 1999Applied Surface Science1999,150,14:1
19Simulation of Berkovich nanoindentation experiments on thin films using finite element method显示文摘Lichinchi M Lenardi C Haupt J 1998Thin Solid Films1998,312,:1
20XPS investigation of preferential sputtering of S from MoS2 and deteimination of MoSx stoichiometry from Mo and S peak position 显示文摘Baker M A Gilmore R Lenardi C 1999Applied Surface Science1999,150,:1
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