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17篇 您的检索式:作者名="Inturi"
    题名 作者 年代 出处 被引量
1Novel continuous single-step synthesis of nitrogen-modified TiO_2 by flame spray pyrolysis for photocatalytic degradation of phenol in visible light显示文摘A novel rapid and continuous process has developed for the synthesis of nitrogen-doped TiO_2(N-TiO_2)with flame spray pyrolysis(FSP) method. The nitrogen incorporation into TiO_2 was achieved by a facile modification(addition of dilute nitric acid) in the precursor for the synthesis. The catalysts were characterized by X-ray diffraction, Raman spectroscopy, transmission electron microscopy, diffuse reflectance spectroscopy, and X-ray photoelectron spectroscopy. The doping of nitrogen into the TiO_2 was confirmed by X-ray photoelectron spectroscopy(XPS) and energy dispersive X-ray(EDX) spectroscopy. The UV-vis spectra of the modified catalysts(with primary N source) exhibited band-gap narrowing for 4 N-TiO_2 with band gap energy of 2.89 eV, which may be due to the presence of nitrogen in TiO_2 structure. The introduction of secondary N-source(urea) into TiO_2 crystal lattice results in additional reduction of the band gap energy to 2.68 eV and shows a significant improvement of visible light absorption. The N-TiO_2 nanoparticles modified by using secondary N-source showed significant photocatalytic activity under visible light much higher than TiO_2. The higher activity is attributed to the synergetic interaction of nitrogen with the TiO_2 lattice. The lowering of the band-gap energy for the flame made N-doped TiO_2 materials implies that the nitrogen doping in TiO_2 by aerosol method is highly effective in extending the optical response of TiO_2 in the visible region. The nitrogen atomic percentage has increased monotonically(0.09%-0.15%)with the increase in primary nitrogen source(nitric acid), and significantly boosted to 0.97% when secondary nitrogen source(urea) was introduced. The highest rate of phenol degradation was obtained for catalysts with secondary N source due to increase in N content in the catalyst.Thirupathi Boningari Siva Nagi Reddy Inturi Makram Suidan Panagiotis G.Smirniotis 2018Journal of Materials Science & Technology2018,34,9:2
2Localized corrosion of nanocrystalline 304 type stainless steel films 显示文摘Inturi R B Szklarska-Smialowska Z 1992Corrosion1992,48,5:1
3Activation of DNA damage repair pathways in response to nitrogen mustard-induced DNA damage and toxicity in skin keratinocytes显示文摘Inturi S Tewari-Singh N Agarwal C White CW Agarwal R 2014Mutat Res Fundam Mol Mech Mutagen2014,76,:1
4Organic additives in the electrochemical preparation of soft magnetic CoNiFe films 显示文摘Tabakovic I Riemer S Inturi V 2000J Electrochem Soc2000,147,1:1
5显示文摘 Riemer S Inturi V Jallen P Thayer A 2000J Electrochem Soc2000,147,1:1
6Dependence of the pitting potential of Al alloys on solubility of alloying element oxides显示文摘Inturi R B Szklarska-Smialowska Z 1993Corrosion Science1993,34,4:1
7Absence of a p53 allele delays nitrogen mustard-induced early apoptosis and inflammation of murine skin显示文摘INTURI S TEWARI-SINGH N JAIN A K 2013Toxicology2013,311,3:1
8Organic additives in the electrochemical preparation of soft magnetic CoNiFe films显示文摘TABAKOVIC I RIEMER S INTURI V 2000Electrochem Soc2000,147,1:1
9Mechanisms of sulfur mustard analog 2-chloroethyl ethyl sulfide-induced DNA damage in skin epidermal cells and fibroblasts显示文摘Inturi S Tewari-Singh N Gu M 0,,12:1
10Structural and mechanical characterization of Cr-Ta-N hard coatings prepared by reactive magnetron sputtering显示文摘 Inturi R B Barnard J A 1996Surf Coat Technol1996,82,:1
11Organic additives in the electrochemical preparation of soft magnetic CoNiFe films显示文摘TABAKOVIC I RIEMER S INTURI V 2000J Electrochem Soc2000,147,1:1
12Composition,structure,stress,and coercivity of electrodeposited soft magnetic CoNiFe films:thickness and substrate dependence显示文摘TABAKOVIC I INTURI V RIEMER S 2002J Electrochem Soc2002,149,1:1
13显示文摘Tabakovic I Riemer S Inturi V 2000J Electrochem Soc2000,147,1:1
14Localized corrosion of nanocrystalline 304 type stainless films显示文摘Inturi RB Szklavska-Smialowska Z 0,,:1
15显示文摘Klemmer T J Inturi V R Minor M K 1997Appl Phys Lett1997,70,:1
16Catalytic antioxidant AEOL 10150 treatment ameliorates sulfur mustard analog 2-chloroethyl ethyl sulfide-associated cutaneous toxic effects 显示文摘Tewari-Singh N Inturi S Jain AK 2014Free Radic Biol Med2014,72,2:1
17Design, Synthesis and 3D - QSAR Studies of New Diphenylamine Containing 1,2,4 - Tria- zoles as Potential Antitubercular Agents显示文摘Mohan KK Inturi B Pujar GV 2014Eur J Med Chem2014,84,:1
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