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51篇 您的检索式：作者名="Helmersson U"

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	题名	作者	年代	出处	被引量
1	Optical properties of anatase TiOz thin films prepared by aqueous sol-gel process at low temperature显示文摘	Wang Z C Helmersson U Kall Per-Olov	2002	Thin Solid Films2002，405，：	1
2	Growth of single-crystal TiN/VN strained-lay superlattiees with extremely high mechanical hardness 显示文摘	HELMERSSON U TODOROVA S BARNETT S A	1987	Journal of Applied Physics1987，62，2：	1
3	Growth of single- crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness 显示文摘	Helmersson U Todorova S Barnett S A	1987	Journal of Applied Physics1987，62，2：	1
4	Growth of Single Crystal TiN/VN Strained-Layer Superlattices with Extremely High Mechanical Hardness显示文摘	Helmersson U Toderova S Marbert L	1987	Journal of Applied Physics1987，62，2：	1
5	Growth of Single-Crystal TiN/VN Strained-Lay Super-Lattices with Extremely High Mechanical Hardness显示文摘	Helmersson U Todorva S Barnett S A	1987	Journal of Applied Physics1987，62，2：	1
6	for TEM of film-substrate c difference in sputtering yields Microscopy Technique, 1986, Cross-Section preparation ombinations with a large 显示文摘	Helmersson U Sundgren J E	1986	Journal of Electron1986，4，4：	1
7	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
8	Growth of single-crystal TiN/VN strained-layer superlattices with extremely hardness显示文摘	HELMERSSON U TODOROVA S BARRETT S A	1987	Application Physics1987，62，2：	1
9	Growth of single-crystal TiN/VN strained-lay super-lattices with extremely high mechanical hardness显示文摘	Helmersson U Todorova S Barnett S A	1987	Journal of Applied Physics1987，62，2：	1
10	Ion- ized physical vapor deposition ( IPVD ) : A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
11	Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardness显示文摘	HELMERSSON U TODOROVA S BARNETT S A	1987	J Appl Phys1987，62，2：	1
12	Phase control of Al2O3 thin films grown at low temperatures 显示文摘	Andersson J M Wallin E Helmersson U	2006	Thin Solid Films2006，513，：	1
13	Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge 显示文摘	GUDMUNDSSON J T ALAMI J HELMERSSON U	2001	Applied Physics Letters2001，78，：	1
14	Fully dense, non-faceted 1 ll-textured high power impulse magnetron sputteringTiN films grown in the absence of substrate heating and bias 显示文摘	LATTEMANN M HELMERSSON U GREENE J E	2010	Thin Solid Films2010，518，：	1
15	Growth of Sin- gle-Crystal TiN/VN Strained-Layer Superlattices with Ex- tremely High Mechanical Hardness 显示文摘	Helmersson U Todorova S Barnett S A	1987	Journal of Applied Physics1987，62，2：	1
16	A novel pulsed magnetron sputter technique utilizing very high target power densities 显示文摘	KOUZNETSOV V MACfi K K SCHNEIDER J M HELMERSSON U PETROV I	1999	Surface and Coatings Technology1999，122，：	1
17	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J PERSSON P A O HELMERSSON U	2006	Surface and Coatings Technology2006，200，：	1
18	Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steeredcathodic arc/unbalanced magnetron technique 显示文摘	EHIASARIAN A P HOVSEPIAN P E HULTMAN L HELMERSSON U	2004	Thin Solid Films2004，457，：	1
19	Optical Properties of Anatase TiO, Thin Films Prepared by Aqueous Sol-gel Process at Low Temperature 显示文摘	Wang Z Helmersson U Kall P 0	2002	Thin Solid Films2002，405，：	1
20	显示文摘	Helmersson U Todorova S Barnett S A	1987	J Appl Phys1987，62，2：	1

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